Laboratories
MEMS Lab.
(60-3) |
Deep Reactive Ion Etching System (DRIE) |
1 |
(60-5) |
General Equipment for Clean Room |
1 |
No. |
Equipment |
Date of installation |
1. |
Clean room facility |
2020 |
2. |
Ultrasonic wire bonder |
2013 |
3. |
Dicing saw |
2013 |
4. |
Fluorescence microscope |
2021 |
5. |
Drying oven |
2020 |
6. |
Direct Laser Write Lithography System |
2019 |
7. |
Sputtering and thermal evaporation system |
2019 |
8. |
Spin coater |
2019 |
9. |
Fume hood |
2019 |
10. |
Deionized (DI) water system |
2019 |
11. |
Nitrogen gas generation machine |
2019 |
12. |
Digital aluminum-top hotplates with stirrers |
2019 |
13. |
Water chiller unit |
2019 |
14. |
Ultrasonic cleaner |
2020 |
15. |
MASKLESS ALIGNER lithography machine |
2024 |
16. |
SAMCO DRIE (Dry etching) |
2024 |