Laboratories

MEMS Lab.

(60-3)

Deep Reactive Ion Etching System (DRIE)

1

(60-5)

General Equipment for Clean Room

1

No.

Equipment

Date of installation

1.

Clean room facility

2020

2.

Ultrasonic wire bonder

2013

3.

Dicing saw

2013

4.

Fluorescence microscope

2021

5.

Drying oven

2020

6.

Direct Laser Write Lithography System

2019

7.

Sputtering and thermal evaporation system

2019

8.

Spin coater

2019

9.

Fume hood

2019

10.

Deionized (DI) water system

2019

11.

Nitrogen gas generation machine

2019

12.

Digital aluminum-top hotplates with stirrers

2019

13.

Water chiller unit

2019

14.

Ultrasonic cleaner

2020

15.

MASKLESS ALIGNER lithography machine

2024

16.

SAMCO DRIE (Dry etching)

2024